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Ideal for organic EL substrate cleaning! Alkaline-compatible spin cleaning device.
This device manually sets the workpiece onto the main body, performs vacuum suction, and conducts two-liquid cleaning, ultrasonic cleaning, and N2 blow drying while spinning.
Make effective use of limited space! It is a tabletop automatic spin cleaning machine.
This device is a tabletop automatic spin cleaner that manually sets the target workpiece and performs ultrasonic cleaning, pure water rinsing, and air blow drying through spin rotation.
This is a device that performs brush cleaning, ultrasonic cleaning, rinse cleaning, and N2 blow drying processes!
This is a space-saving, double-sided washable mechanism for a sheet-type spin cleaning device. It is easy to maintain and features high-speed spin drying and N2 drying, which reduces water marks. (Patent No. 3558543)
Full automatic spin cleaning device for 300mm/8-inch wafers, glass.
This device manually sets a wafer cassette into the main body, sends the stored target work to the spin cleaning section using a robot, and performs two-fluid cleaning, ultrasonic cleaning, and N2 blow drying while spinning, before storing it back in the wafer cassette.
The brush is cleaned with detergent (surfactants, etc.) by spinning rotation.
The "Compact Spin Cleaning Device ME-510" is a manual spinner that allows the operator to set the target workpiece manually. It performs brush cleaning with detergent (such as surfactants) through spin rotation, followed by pure water rinsing and air blow drying. The maximum rotation speed is 3000 rpm, and it accommodates sample sizes ranging from 30 to 150 mm, including PET film and glass. The brush section features brush elevation, rotation, and detergent supply, while the pure water supply section operates with a rotary air cylinder for pure water delivery. The main body dimensions are W650 x D800 x H710, and it has an aluminum frame. For more details, please contact us or refer to the catalog.
